CEA-Leti uses maskless e-beam lithography for 22nm features

02/14/2012 | EE Times

CEA-Leti reports it has been able to fabricate 22-nanometer lines and spaces on chips using direct-write electron-beam lithography systems. Mapper Lithography, the manufacturer of the maskless e-beam lithography equipment, plans to continue its research and development collaboration with CEA-Leti, which sees the Mapper systems as capable of producing 14nm and 10nm features.

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