Imec CEO: Let's consider litho alternatives to EUV for 14nm chips

12/17/2012 | Electronics Weekly (U.K.)

Extreme-ultraviolet lithography systems will not be capable of producing semiconductors with 14-nanometer feature in mass volume by 2014, says Luc Van den hove, CEO of the Imec research consortium. The industry may need to resort to the more expensive method of triple patterning to turn out 14nm chips in volume, he adds.

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Electronics Weekly (U.K.)

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