Intel remains committed to using extreme-ultraviolet lithography when the time comes to make chips with 10-nanometer dimensions, with plans to install an EUV pilot line by the end of this year. Still, the chipmaker may turn to immersion lithography with multi-patterning schemes for 10nm devices if EUV doesn't work out, said Sam Sivakumar, director of lithography in the company's Portland Technology Development Group.

Full Story:

Related Summaries