Laser light sources for extreme-ultraviolet lithography systems can only produce 30 watts of power, while 250 watts are needed for volume production of semiconductors with the advanced tools, according to IBM. ASML Holding has been delayed in delivering an EUV system for IBM to use at a research-and-development facility in Albany, N.Y. As a result, IBM researchers have been working on alternatives to EUV, such as double-pattern lithography, IBM's Gary Patton reported.

Related Summaries